MASCARILLA REPARADORA POST-TRATAMIENTO

Introducción:
Experience ultimate relief with our POST-TREATMENT REPAIR MASK, designed to calm and hydrate your skin while providing a refreshing cooling effect.

Key ingredients:
· Hydroxyacetophenone: An antioxidant and soothing agent that also stabilizes the formulation.

• alantoína: Conocido por sus propiedades calmantes y curativas., ayuda a calmar la piel irritada.
• Sodium Hyaluronate: A form of hyaluronic acid that provides deep hydration and plumps the skin.
• Portulaca Oleracea Extract (Purslane Extract): Known for its anti-inflammatory and antioxidant properties, it helps to soothe and protect the skin.
• Centella Asiatica Extract, Asiaticoside, Madecassoside: These ingredients are well-known for their soothing, healing, and anti-inflammatory properties, helping to repair and calm the skin.
• Sodium Dextran Sulfate: Provides moisturizing and soothing benefits, helping to improve skin texture.
• Sophora Angustifolia Root Extract: Has anti-inflammatory and antimicrobial properties, ayudando a calmar y proteger la piel.
• Salvia Miltiorrhiza Root Extract: Known for its antioxidant properties, it helps to protect the skin from damage and promote healing.
• Thymus Vulgaris (Thyme) Extracto de hoja: Provides antimicrobial and antioxidant benefits, helping to protect and soothe the skin.
• Coptis Chinensis Root Extract: Known for its antibacterial and anti-inflammatory properties, it helps to calm and protect the skin.